Operando SXRD of E-ALD deposited sulphides ultra-thin films: Crystallite strain and size
نویسندگان
چکیده
منابع مشابه
architecture and engineering of nanoscale sculptured thin films and determination of their properties
چکیده ندارد.
15 صفحه اولMicromechanical characterization of ALD thin films
Aalto University, P.O. Box 11000, FI-00076 Aalto www.aalto.fi Author Maria Berdova Name of the doctoral dissertation Micromechanical characterization of ALD thin films Publisher School of Chemical Technology Unit Materials Science and Engineering Series Aalto University publication series DOCTORAL DISSERTATIONS 119/2015 Field of research Microelectromechanical systems Manuscript submitted 31 Au...
متن کاملEnhanced methanol sensing performance of oblique deposited WO3 thin films
Methanol (CH3OH) is a colorless liquid with a mild odor. The wide ranges of applications, toxicity and clinical implications of methanol have made necessary to develop reliable and high-performance methanol sensors. In this paper, WO3 thin films were deposited on SiO2/Si substrates by e-beam evaporation technique under normal and oblique angles and then post-annealed at 500 °C with a flow of ox...
متن کاملBarrier Properties of ALD W1.5N Thin Films
W1.5N films grown by ALD from WF6, NH3, C2H4 and SiH4 as precursors were tested as Cu diffusion barriers in p/n diodes and capacitors with SiO2 as a dielectric. I-V and C-V, C-t characteristics were measured before and after anneal. The layers exhibit excellent barrier properties against both Cu and Al interaction with silicon. No changes of current and capacitance attributed to a barrier failu...
متن کاملPhysical Properties of Reactively Sputter-Deposited C-N Thin Films
This work aims to prepare and study amorphous carbon nitride (CNx) films. Films were deposited by reactive magnetron radiofrequency (RF) sputtering from graphite target in argon and nitrogen mixture discharge at room temperature. The ratio of the gas flow rate was varied from 0.1 to 1. Deposited films were found to be amorphous. Highest Nitrogen concentration achieved was 42 atomic percent whic...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Applied Surface Science
سال: 2018
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2017.07.294